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Reply from SapContact on Sep 17 at 3:36 AM Here is some info for you. Let me know if you require any further info.
Functional location edit mask
The edit mask describes the structure that the identification of a
functional location is to have. The mask must consist of at least one
character, which cannot be a separator.
An edit mask generally consists of several blocks of characters, which
are clearly marked at the end by the number of a hierarchy level. In
addition, the individual blocks can be visually divided from one another
by separators.
You can use the following signs when structuring the block:
"A" only letters can be entered
"N" only numbers can be entered
"X" both numbers and letters can be entered
"S" numbers, letters, and special characters can be entered
The following special characters are allowed:
& ( ) + , . / : ; < = >
The following sig
- hyphen
/ slash
' ' blank
. period
_ underscor
= equals si
+ plus sign
; semicolon
: colon
Functional Location Hierarchy Levels
Hierarchy levels subdivide a functional location into different layers.
Dependencies
The levels are specified in single figures. Only the numbers from 0 to 9
can be used for this. Level 10 is represented by the figure 0, level 11
by the figure 1, and so on.
Example
For example, the correct numbering of hierarchy levels in a structure
could appear as follows:
Structure: XXX-XX_XXX.X-XXX=X/XX;XXX-XX/X:XX-X/X
Levels: 1 2 3 4 5 6 7 8 9 0 1 2 3
| | | ---------------Original Message---------------
From: bodleram891
Sent: Wednesday, September 17, 2014 3:28 AM
Subject: Use Separater Like / And * In Edit Mask While Creating Structure Indicator
Hi Everyone,
Can we use separator like / and * in edit mask while creating functional location and what are the level we use?
Please Explain |
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